X-ray Photoelectron Spectroscopy
PHI Genesis (XPS) - Surface analysis Instrument
The PHI Genesis from ULVAC-Physical Electronics is a state-of-the-art X-ray Photoelectron Spectroscopy (XPS) system designed for advanced surface chemical analysis, with sensitivity to the top ~10 nm of surfaces. Also referred to as Electron Spectroscopy for Chemical Analysis (ECSA), it provides high-resolution elemental and chemical state information with exceptional sensitivity and spatial resolution, making it ideal for research in tribology, lubrication science, materials science, nanotechnology, catalysis, thin films, semiconductors, and surface engineering.
Specifications:
- X-ray Source: Monochromated Al Kα (1486.6 eV)
- X-ray Spot Size: 5–200 µm
- Charge Neutralization: Dual electron (E_Neut) and ion (I_Neut) neutralizers
- Ion Gun: Monoatomic Ar⁺ (500 eV–5 keV)
- Sample Stage: Motorized multi-axis
- Sensitivity: <0.1 atomic % detection limit
Capabilities:
- Depth Profiling: Monoatomic Ar⁺ ions (500 eV – 5 keV) enable precise sputter profiling of thin films and multilayer structures.
- Elemental Analysis: Detects all elements except H and He with high quantitative accuracy.
- Chemical State Identification: High-resolution spectra allow clear differentiation of oxidation states and chemical bonding environments.
- Fully Automated Multi-Technique Platform: Features auto-tuning, calibration, multi-sample handling, and automated sample parking for high-throughput, unattended operation.
- Micro-Focused Scanning X-Ray & SEM-Like Navigation: Monochromatic, micro-focused X-ray beam (minimum spot size 5 µm with Al Kα) combined with X-ray–induced secondary electron imaging (SXI) provides SEM-style navigation for precise site selection, mapping, and depth profiling.